2004_13_Metrology.pdfVIP

INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS 2004 UPDATE Metrology Jointly Sponsored by European Semiconductor Industry Association Japan Electronics and Information Technology Industries Association Korea Semiconductor Industry Association Taiwan Semiconductor Industry Association Semiconductor Industry Association THE ITRS IS DEVISED AND INTENDED FOR TECHNOLOGY ASSESSMENT ONLY AND IS WITHOUT REGARD TO ANY COMMERCIAL CONSIDERATIONS PERTAINING TO INDIVIDUAL PRODUCTS OR EQUIPMENT . i TABLE OF CONTENTS Metrology 1 2004 Update Highlights 1 Working Group Tables 2 LIST OF TABLES Table 115 Metrology Difficult Challenges 2 Table 116a Metrology Technology Requirements—Near-term 3 Table 116b Metrology Technology Requirements—Long-term 4 Table 117a Lithography Wafer Metrology Technology Requirements—Near-term UPDATED 5 Table 117b Lithography Metrology Technology Requirements—Long-term UPDATED 7 Table 118a Lithography Metrology (Mask) Technology Requirements: Optical—Near-term 8 Table 118b Lithography Metrology (Mask) Technology Requirements: EUV—Near and Long- term 9 Table 118c Lithography Metrology (Mask) Technology Requirements: EPL—Near and long-term 11 Table 119a Front End Processes Metrology Technology Requirements—Near-term UPDATED 12 Table 119b Front End Processes Metrology Technology Requirements—Long-term UPDATED 13 Table 120a Interconnect Metrology Technology Requirements—Near Term 14 Table 120b I