AlN陶瓷表面钛金属化反应机理及微观结构.pdf

第3 期 电 子 元 件 与 材 料 Vol.22 No.3 2003 年3 月 ELECTRONIC COMPONENTS MATERIALS M a r . 2003 研究与试制 R D AlN 陶瓷表面钛金属化反应机理及微观结构 1 2 1 黄奇良 潘 伟 张 直 1.广西民族学院化学化工系 广西 南宁 5300062.清华大学材料科学与工程系 北京 100084 摘要:通过X 射线衍射分析和扫描电镜观察研究了利用融盐热歧化反应法在氮化铝陶瓷表面生成的钛金属 化复合膜的组成 金属化膜与氮化铝陶瓷基体之间的界面反应及界面层的显微结构 研究发现 钛金属 化膜非常均匀致密 膜层与氮化铝陶瓷基体结合紧密 形成了一扩散层 钛与铝组元浓度在该扩散层中 呈梯度分布 沉积到AlN 陶瓷表面的钛金属与AlN 发生反应主要生成TiN TiAl 和Ti Al 0.3 3 9 23 关键词:界面反应 界面微观结构 金属化 氮化铝 中图分类号: TM28 文献标识码:A 文章编号:1001-2028 2003 03-0007-03 Interfacial Reaction and Microstructure between AlN and Ti Deposited on AlN Ceramic Surface 1 2 1 HUANG Qi-liang , PAN Wei , ZHANG Zhi (1. Department of Chemistry and Chemical Engineering, Guangxi University of Nationalities, Nanning 530006, China; 2. Department of Material Science and Engineering, Tsinghua University, Beijing 100084, China) Abstract: The mechanism of interfacial reaction between AlN and Ti deposited by disproportional reaction method has been determined. The composition of the coating layers and the microstructure of the reaction products were investigated by XRD and SEM. The result show that the metallized film was consisting of TiN , TiAl and Ti Al . The metallized film is 0.3 3 9 23 homogenous and firmly bound onto the AIN ceramics surface. Key words : interfacial reaction; interfacial microstructure; metallization; AlN ceramic s