大气压下冷等离子弧制备SiO_x涂层超疏水表面.pdf

真空科学与技术学报 第30卷第1期 OFVACUUM CH刑ESE SCIENCEANDTECHNOLOGY 2010年1、2月 JOURNAL 大气压下冷等离子弧制备SiOx涂层超疏水表面 周 振1 陈 强1’ 刘福平1任兆杏2 (1．北京印刷学院印刷包装材料与技术北京市重点实验室北京102600； 2．合肥研飞电器科技有限公司合肥230088) ColdPlasma SiOxSuperhydrophobicCoatingsDepositedby Arcat Pressure Atmospheric Zhou Zhenl，Chen Qian91’，LiuFuping．1，RenZhaox《 and (1．LaboratoryofPlasmaPhys赴sMaterials，蜘InstituteofGraphicCommlulication，蚍，102600，China； and 23(D88，CHina) 2．心觎蚴Electric却脚Sck,nceTechnologyCo．，Ltd，Hefei AbstractThe were cold arc at SiOx coatings superhydrophobicgrownby plasmadepositionatmosphericpressure themonomer．Theofthefilm thenozzle- with(cn3)3SiOSi(CH3)3(HMDSO)asimpacts growthconditions，including of substrate rate the themicrostructuresand ofthefilmwere distance，flow monomer，anddepositiontime，on properties studied．Thesurface and ofthe werecharacterizedwitllFouriertransforminfrared morphologieshydrophobicitycoating force andotherconventional resultsshow spectroscopy(mR)，atomicmicroscopy(ArM)，opticalmicroscopy probes．The thatthe awatercontact than be underthe SiOx 1600，candeposited superhydrophobiecoatings，with anglehigher optimized nozzle—substratedistanceof10am．amonomerflowrateof90mL·min一1