Development+of+the+laser+method.pdf

Archives Volume 38 International Scientific Journal of Materials Science Issue 1 published monthly by the July 2009 World Academy of Materials and Engineering Pages 5-11 and Manufacturing Engineering Development of the laser method of multicrystalline silicon surface texturization L.A. Dobrzañski a,*, A. Dryga³a a, P. Panek b, M. Lipiñski b, P. Ziêba b a Division of Materials Processing Technology, Management and Computer Techniques in Materials Science, Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland b Institute of Metallurgy and Materials Science, Polish Academy of Sciences, ul. Reymonta 25, 30-059 Kraków, Poland * Corresponding author: E-mail address: leszek.dobrzanski@polsl.pl Received 11.02.2009; published in revised form 01.07.2009 ABSTRACT Purpose: The aim of the paper is to demonstrate a laser method of multicrystalline silicon texturization. This means creating a roughened surface so that incident light may have a larger probability of being adsorbed into the solar cell. It was demonstrated, that laser processing is very promising technique for texturing multicrystalline silicon independent on crystallographic orientation of grains compared to conventional texturing methods. Design/methodology/approach: The topography