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Study on high pressure plasma produced by ArF laser
4
0 Study on high pressure plasma produced by ArF
0
2
laser
v
o
N Norio Tsuda∗ and Jun Yamada
7 Dept. Electronics, Aichi Institute of Technology,
] 1247 Yakusa-cho, Yachigusa, Toyota, 4700392, JAPAN
h * E-mail:n-tsuda@aitech.ac.jp
p
-
m Abstract.
s When an ArF excimer laser beam was focused in a high pressure argon gas from 50
a
l to 130 atm, the plasma development is observed by streak camera from side window of
p
. chamber. The high pressure ArF laser plasma develops symmetrically and the plasma
s
c produced by ArF excimer laser hardly develops as compared with the plasma produced
i by XeCl. The photon energy of ArF laser light is higher than the XeCl laser. The
s
y transmittance of ArF laser light was measured. Almost all the laser light is transmitted
h as the frequency of laser light is higher than the plasma frequency, and the energy of
p
[ laser light is hardly working for plasma development. The backward and forward
plasma development produced by the ArF laser was calculated by the breakdown wave
1 and the radiation supported shock wave, which agreed with the experimental one.
v
8 The backward development mechanism of high pressure ArF plasma is same as one
6 of plasma produced by XeCl laser. However, the forward development mechanism of
0 ArF plasma differs from one of plasma produced by XeCl laser.
1
1
4
0
/
s 1. Introduction
c
i
s
y When a high pressure gas is irradiated by
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