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Plasma generation and plasma sources
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2000 Plasma Sources Sci. Technol. 9 441
(/0963-0252/9/4/301)
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Plasma Sources Sci. Technol. 9 (2000) 441–454. Printed in the UK PII: S0963-0252(00)17858-2
Plasma generation and plasma
sources
H Conrads and M Schmidt
¨
INP Greifswald, Institut fur Niedertemperatur-Plasmaphysik e.V.,
Friedrich Ludwig-Jahn-Str. 19, D-17489 Greifswald, Germany
Received 1 October 1999, in final form 27 September 2000
Abstract. This paper reviews the most commonly used methods for the generation of
plasmas with special emphasis on non-thermal, low-temperature plasmas for technological
applications. We also discuss various technical realizations of plasma sources for selected
applications. This paper is further limited to the discussion of plasma generation methods
that employ electric fields. The various plasmas described include dc glow discharges, either
operated continuously (CW) or pulsed, capacitively and inductively coupled rf discharges,
helicon discharges, and microwave discharges. Various examples of technical realizations of
plasmas in closed structures (cavities), in open structures (surfatron, planar plasma source),
and in magnetic fields (electron cyclotron resonance sources) are discussed in detail. Finally,
we mention dielectric barrier discharges as convenient sources of non-thermal plasmas at
high pressures (up to atmospheric pressure) and beam-produced pla
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