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《Pulsed laser vaporization and deposition》.pdf

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《Pulsed laser vaporization and deposition》.pdf

RMP Colloquia Pulsed laser vaporization and deposition P. R. Willmott* and J. R. Huber ¨ ¨ Physikalisch-Chemisches Institut der Universitat Zurich, Winterthurerstrasse 190, ¨ CH-8057 Zurich, Switzerland Photons have many advantages for vaporizing condensed systems, and laser vaporization sources have a flexibility not available with other methods. These sources are applied to making thin films in the well-known technique of pulsed laser deposition (PLD). The vaporized material may be further processed through a pulsed secondary gas, lending the source additional degrees of freedom. Such pulsed-gas sources have long been exploited for fundamental studies, and they are very promising for film deposition, as an alternative to chemical vapor deposition or molecular beam epitaxy. The authors outline the fundamental physics involved and go on to discuss recent experimental findings. CONTENTS The regime of nonthermal interactions in its most general sense describes physical and chemical processes I. Introduction 315 such as the breaking and making of chemical bonds by II. Pulsed Laser Deposition 317 ensembles of species that have energy distributions that A. General features 317 cannot be described by the Maxwell-Boltzmann equa- B. Light-material interaction 318 tion and therefore cannot be described by a single tem- C. Plasma generation

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