磁控溅射制备铝薄膜.doc

磁控溅射制备铝薄膜 摘 要 铝金属具有良好的导电性、导热性、耐腐蚀性、吸引性及耐核辐射性等优良性质，并且具有良好的光电性能等优良性质。其优异的光学性质和电学性质，使得铝薄膜在微电子电路、薄膜电路和光学薄膜中被广泛应用。目前，铝薄膜的研究主要有两个方面：一方面研究超薄铝薄膜的光学特性和电性能；另一方面研究铝薄膜在制备多层薄膜中的作用。 本设计利用磁控溅射法来制备铝薄膜，并通过对工作气压以及溅射温度的控制来研究这些参数条件对铝薄膜折射率以及其微观结构的影响。利用椭圆偏振测厚仪来测量薄膜折射率，用原子力显微镜以及金相显微镜来观测铝薄膜的表面形貌以及颗粒大小等。从数据的分析中得到工作气压以及基片温度与铝薄膜的复折射率和表面形貌的关系。实验结果表明：随着工作气压的增大，薄膜沉积速率先变大后减小；随着基片温度升高，薄膜粗糙度上升，颗粒变大。 关键词：磁控溅射；铝薄膜；微结构；表面形貌 Magnetron sputtering thin film of aluminum Abstract Aluminum metal has good electrical conductivity, thermal conductivity, corrosion resistance, draw resistance and radiation resistance and other excellent properties, and has good optical properties such as excellent properties. Its excellent optical properties and electrical properties, making aluminum films in microelectronic circuits, a thin film circuit and the optical thin film is widely used in. At present, the Al thin film research mainly has two aspects: on the one hand ultrathin aluminum films optical and electrical properties; on the other hand the aluminum thin films in the fabrication of multilayer film in rats. This design uses a magnetron sputtering method to prepare the Aluminum film, and through the work pressure and sputtering temperature control to study the influence of the refractive index of Aluminum, as well as the microstructure of these parametric conditions. Ellipsometry Thickness Gauge to measure the refractive index, using atomic force microscopy and metallographic microscope to observe the surface morphology and particle size of the Aluminum film. From the data analysis of the relationship between working pressure and substrate temperature and the complex refractive index and surface morphology of the Aluminum film. The experimental results show that: with the increase of working pressure, deposition rate first larger decreases; film roughness increased with increasing substrate temperature, the particles become larger. Keywords: Magnetron sputtering; thin film of aluminum; Micro struct