(半导体工艺简介.ppt

* 集成电路制造工艺简介 生产工厂简介 国外某集成电路工厂外景 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. * Fab Two was completed January 2, 1996 and is a State of the Art facility. This 2,200 square foot facility was constructed using all the latest materials and technologies. In this set of cleanrooms we change the air 390 times per hour, if you do the math with ULPA filtration this is a Class One facility. We have had it tested and it does meet Class One parameters (without any people working in it). Since we are not making microprocessors here and we dont want to wear space suits, we run it as a class 10 fab. Even though it consistently runs well below Class Ten. 1级净化厂房/10级净化厂房 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. * Here in the Fab Two Photolithography area we see one of our 200mm 0.35 micron I-Line Steppers. this stepper can image and align both 6 8 inch wafers. 投影式光刻机 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. * Another view of one of the Fab Two Photolithography areas. 投影式光刻机 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. * Here we see a technician loading 300mm wafers into the SemiTool. The wafers are in a 13 wafer Teflon cassette co-designed by Process Specialties and SemiTool in 1995. Again these are the worlds first 300mm wet process cassettes (that can be spin rinse dried). 硅片清洗装置 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. * As we look in this window we see the Worlds First true 300mm production furnace. Our development and design of this tool began in 1992, it was installed in December of 1995 and became fully operational in January of 1996. 12英寸氧化扩散炉 Evaluation only. Created with Aspose.Slides for .NET 3.5 Clien