利用DeepRIE體型微細加工技術後製程之微機電平面圓形螺旋電感.docVIP

以Deep RIE體型微加工之後製程的微機電雙層並聯平面圓形螺旋電感 Planar Multi-layer MEMS Circular Spiral Inductors using Deep RIE Bulk Micromachining Post Process IC 編號：M25-92D-02t 指導教授：莊惠如 成功大學電機系教授 電話：(06)2757575-62374 傳真：(06)2748690 E-mail: chuangh@ee.ncku.edu.tw 設計者：李威廷 成功大學電機所碩士班研究生 電話：0952012059 傳真：(06)2763890 E-mail: n2691169@ccmail.ncku.edu.tw 中文摘要 本次testkey設計了數個可應用於匹配電路、source degeneration的圓形螺旋電感以提供RFIC電路設計使用，，，，，，，： ，、s，，，，，，，，，、s=2、R=60、2.5、3.5、4.5、5.5，：，，，，，，，，，，。 預計規格與實測結果 本次設計之圓形螺旋電感晶片回來後先將量測到之S參數以open pad de-embedding法將電感對pad之寄生電容效應去除，：，，。 ，。，，，，，。，，，，、spin coater，。，，，，。及皆比單層螺旋電感低，，，，，。 及皆隨電感圈數增加而減少，及則皆隨電感圈數增加而增加。值並不會隨著圈數增加而增加，，，，。“A broadband parameter extraction technique for the equivalent circuit of planar inductors”, IEEE MTT-S Digest, vol.3, pp. 1345-1348, June, 1992. Chia-Ying Lee, Yao-Huang Kao, Jiunn-Jye Luo, and Kow-Ming Chang, “The enhanced Q spiral inductors with MEMS technology for RF applications”, Thesis of Institute of Electronics Engineering in National Chiao Tung University, R.O.C., 2000. Mehmet Ozgur, Mona E. Zaghloul, and Michael Gaitan, “Optimization of backside micromachined CMOS inductors for RF applications”, IEEE International Symposium on Circuits and Systems, vol. 5, pp. 185-188, May 28-31, 2000. Héctor J. De Los Santos, “On the ultimate limits of IC inductors-An RF MEMS perspective”, IEEE Electronics Components and Technology Conference, pp. 1027-1031, 2002. Marc J. Madou, Fundamentals of Microfabrication, CRC Press LLC, 2002. Ryan Lee Bunch, A Fully Monothilic 2.5GHz LC Voltage Controlled Oscillator in 0.35μm CMOS Technology, Thesis of Masters Degree in Virginia Polytechnic Institute and State University, 2001. Joachim N. Burghartz, “Microwave Inductors and Capacitors in Standard Multilevel Interconnect Silicon Technology,” IEEE Transactions on Microwave Theory and Techniques, vol. 44, no. 1, pp. 100-104, January, 1996. M. Soyuer, J. N. Burghartz, K. A. Jenkins, S. Ponnapalli, J. F. Ewen, and W. E. Pence, “Multilevel Monolithic