Contact Info课件.ppt

MFF Operation Training Handout prepared and written by Patrick Wan Contact Info. Name: Wing Leong, Chung (Zhong Rongliang, 锺荣亮) Email: mfcchung@ust.hk Tel: 2358 7211 Rm: 2130A Examination Time 120 mins Open Book Passing Marks: 2 Qualify Question Part I 25 mc 60% (Safety) Part II 25 mc 60% (Operation) Part III 2 PF 60% (Process Flow) 5 mistakes / PF NFF Operation Training Introduction 概引 Introduction 概引 Contamination and Control 污染與管制 Process Flow 工藝流程 Do’s and Don’t’s 規矩 Discussion on Exam Questions 考題討論 NFF Tour 參觀實驗所 NFF Operation Training Contamination and Control 污染與管制 Research in NFF微電子實驗所的科研項目 Sub-micron SOI Display Technologies MEMS Integrate Power System Advanced Packaging Program Advanced Process Module Developing Sensor Technology Gene Chip Compound Semiconductor Technology Novel Magnetic – electronic devices 亞微米SOI 顯示技術 微機電系統 集成功率系統 先進封裝程序 先進工藝模塊發展 傳感器技術 基因晶片 化合物半導體技術 新微電器件 Outline Contamination Process Verification Scheme Cleanliness Levels Process Compatibility Wafer Status General Processing Requirements of Individual Modules 污染 工藝驗証指引 潔淨級別 工藝兼容性 晶片潔淨指數 個別模組的要求 What is contamination 何謂污染 Contamination is the intrusion of impurities into devices that leads to their failure Examples: Degradation of Oxide Integrity Threshold Voltage Shift Leakage 污染：器件因雜質而導致功能失效 例如： 氧化層失效 國值電壓漂移 漏電 Knock-on Effect Why contamination matters to you?污染與我可干？ It’s like disease, easy to spread across the laboratory It’s hard to be stopped once caused Any contamination you cause ruins others’ years of efforts You are the only one who can help us stop it from spreading 有如瘟疫一般，易於傳播到實驗的每個角落 一旦發生，難以制止 因你做成的污染，可把別人多的努力毀於一旦 可以幫助我們阻止污染傳播開去的，只有你！ 3 Commonest CMOS KillersCMOS三煞 Metallic Contaminants Ions of heavy and transition metals (Au, Ag, Pt, Ni) Ions of standard Metal (Al, Ti) Alkali Ions (K, Na) Orgnaic Photoresist and Polymers Body Oil Particles Carbon Metal pieces from lifted-off wafers You name it 金屬污染物 重金屬和過渡金屬 (金、銀、白金、鎳) 的離子 常規金屬的離子(鋁、鈦) 鹼性離子