薄膜沉积技术幻灯片.pdf

Film Deposition Deposition is the process of depositing films onto a substrate. There are three categories of these films: * POLY * CONDUCTORS * INSULATORS (DIELECTRICS) Poly refers to polycrystalline silicon which is used as a gate material, resistor material, and for capacitor plates. Conductors are usually made of Aluminum although sometimes other metals such as gold are used. Silicides also fall under this category. Insulators refers to materials such as silicon dioxide, silicon nitride, and P-glass (Phosphorous- doped silicon dioxide) which serve as insulation between conducting layers, for diffusion and implantation masks, and for passivation to protect devices from the environment. 半导体工艺中所涉及的常用薄膜： Poly- Si SiH4 Epi-Si SiH Cl 2 2 SiO SiH +O 2 4 2 Si N SiH Cl +NH 3 4 2 2 3 PSG SiH +PH +O 4 3 2 Al, Cu, W…… WSi WF +SiH 6 4 MoSi MoF +SiH 6 4 … … （PSG = Phospho-Silicate Glass) Deposition Method: There are two major classifications of deposition techniques each having its own subset of related techniques: Sputtering (溅射） Evaporation (蒸发） CVD技术： 使用加热、等离子体或紫外线等各种能源，使 气态物质经化学反应（热解或化学合成）形成固态物 质淀积在衬底上的方法，叫做化学汽相淀积 (Chemical Vapor Deposition)技术