中频非平衡磁控溅射制备Ti NC 膜 - Journal of Northeastern University.PDF

第29 卷第7期 东 北 大 学 学 报 ( 自 然 科 学 版 ) Vol129, No. 7 2 00 8 年 7 月 Journal of Northeastern U niversit ( Natural Science) Jul. 2 0 0 8 T-i N-C 1 1 1 2 张以忱, 巴德纯, 颜云辉 , 马胜歌 ( 1. , 110004; 2. 863 , 518029) : , , T i/ T iN/ T i( C, N) # : , # , # # # , # # : T-i N-C ; ; ; ; : T B 742 : A : 1005-3026( 2008) 07- 1049-04 Ti-N-C Films Deposited by MF Unbalanced Magnetron Sputtering Process with Twin Targets 1 1 1 2 ZHAN G Yi-chen , BA De-chun , YAN Yun-hui , MA Sheng-ge ( 1. School of Mechanical Engineering Automation, Northeastern Universit , Shen ang 110004, China; 2. National R D Center for Surface Engineering of China, Shenzhen 518029, China: Correspondent: ZHA NG Y-i chen, E-mail: chzhang @ me. neu. edu. cn) Abstract: Introducing the Hall ion source assisted MF unbalanced magnetron sputtering process w ith tw in targets, the Ti/ TiN/ Ti( C, N) ant-i wear hard films w ere deposited on such substrates as stainless and high-speed steels through changing the w orking ambience, bias mode, sputtering current and ion beam assisted current . The color, cr stal structure and film. s bonding strength are all tested and anal zed. The results show ed that the color of films is highl sensitive to testing am