化学气相沉积碳化钛的热力学和动力学研究-材料工程.PDF

Thermodynamic and Kinetic Studies on Chemical Vapor Deposition Process of TiC ( ) Guo Haiming Shu Wubing iao ShengruBai Shihong Meng Guowen ( Northwestern Polytechnical University ,Xi an) [ ] TiCl -CH -H 4 4 2 , T iC , T iC , [ Abstract ] Thermodynamic analyses for chemical vapor deposition( CVD) process of T iC 4 - 4 - 2 . from TiCl CH H system was made The kinetic characteristics of T iC CVD process at different deposition temperature, and the effects of the supersaturation of the vapor and the nucleation processes on the deposition morphology of TiC coating in different type of kinetic mechanism have been studied. T he supersaturation of the vapor and the type of kinetic process involved in the de- position of T iC coating are determining factors for the control of their nucleation and morpholo- gy . Keywords chemical vapor deposition thermodynamic kinetic mechanism 1 , ( CVD) , [1] / T iC CVD , , TiCl -CH -H T iC 4 4 2 , , , TiC , , , T iC [1, 2] , , CVD 2 , , 2. 1 [3] , , ,