基体偏压对高功率脉冲磁控溅射制备类石墨碳膜的影响研究.PDF

33 　10 　　　　　　　　 　　　　　　　 　　　　　　　　　　　 2013 10 CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY 969 　 1,2 1 ＊ 2 ＊ 2 张学谦 　黄美东 　柯培玲 　汪爱英 (1.　　300387;2.　　315201) Impact of Bias on the Graphite-Like Carbon Films Grown by High Power Impulse Magnetron Sputtering 1,2 1 ＊ 2 ＊ 2 Zhang Xueqian ,Huang Meidong ,Ke Peiling ,Wang Aiying (1.Tianjin Normal University, Tianjin 300387, China;2.Ningbo Institute of Materials Technology and Engineering, ChineseAcademy of Sciences, Ningbo 315201, China) 　　Abstract　The graphite-li e carbon (GLC )films were deposited by high power impulse magnetron sputtering (HPPMS)on Si substrates.The impacts of the synthesis conditions,such as the substrate bias,ion energy and pressure,on the properties of the GLC films were evaluated.The GLC films were characterized with X-ray photoelectron spectroscopy (XPS),Raman spectroscopy, atomic force microscopy (AFM ), and conventional mechanical probes.The results show that the substrate bias voltage strongly affects the microstructures and mechanical properties.For instance, as the bias in- creased,the surface became increasingly smooth,accompanied by an increased hardness and internal compressive stress; 2 the sp density changed in a decrease-increase mode,minimized at -100 V .at -300 V,the GLC films display excellent 2 tribological performance, possibly because of the increased sp density and surface hardness, and a decreased surface roughness. 　　 eywords　HIPIMS, Bias voltage,GLC films;Microstructure 　Si , 、、