工艺参数对离子束溅射ZnOBAl薄膜结构与性能的影响摘要.PDF

第30卷 第 5期 真 空 科 学 与 技 术 学 报 2010 年9、10 月 CHINESE JOURNAL OF VACUUM SCIENCE AND ECHNOLOGY 529 工艺参数对离子束溅射ZnOBAl 薄膜结构与性能的影响 * 梁广兴 范 平 张东平 蔡兴民 郑壮豪 (深圳大学物理科学与技术学院薄膜物理与应 研究所 深圳 518060) Structural and Property Characterization of ZnOBAl Films Grown by Ion Beam Sputtering * Liang Guangxing,Fan Ping ,Zhang Dongping, Cai Xingmin,Zheng Zhuanghao (Institute of ThinFilm Physics and Application, College of n Physical Science and Technology ,Shenzhen University, Shenzhen 518060, China) c Abstract heZnOBAl (AZO) films were deposited by ion beam sputtering of the ceramictarget of ZnO dopedwith . 2% (wt.) Al O on BK7glass substrates. he impacts of the deposition conditions on the film growth were experimentally 2 3 studied. he microstructures and properties of theAZO films were characterized with X2ray diffraction, atomic force mi2 m croscopy and conventional surface probes. he results show that the plasma power, substrate temperature and film thick2 o ness affect theAZO growth to avarying degree.For instance, as the thickness increases,the Zn(002) peak goes higher, c coincidingwith growth of ZnOgrains, surface roughening and defects formation. he optimized AZO filmgrowt