激光诊断3.ppt

J. Phys. D: Appl. Phys. 41 (2008) 194006 * * * 75 W C3F6, Aavg (12/02/03) – intensity range is 6000-900000 Add cross-sections? These 2-d images are converted into 1d cross sections by averaging 20 pixels along the laser axis and plotting the signal intensity as a function of distance along the laser beam path. * The broad spatial distribution and the shift of the scattered signal peak maximum away from the molecular beam peak indicate that CF2 radicals scatter with a cosine angular distribution. * Does Ei affect S(CF2)? Scatter Beam + Scatter Substrate Laser Substrate Laser Molecular Beam Molecular Beam Beam Laser Molecular Beam LIF of NH2 in NH3+CH4 Plasma Liu et al., JVST 2007 IRIS Data for CN, NH, and NH2 Liu et al., JVST 2007 Surface Reactivies of Various Radicals Liu et al., Pure Appl. Chem.2006. AX AXY CH CH2 CF CF2, CHF CCl CCl2, CHCl, CFCl CBr CBr2, CHBr, CFBr, CClBr SiH SiH2 SiF SiF2, SiHF SiCl SiCl2, SiHCl, SiFCl SiBr SiBr2, SiHBr, SiFBr, SiClBr Surface Reactivity Analysis of AX and AXY Radicals (A=C and Si; X,Y=H, F, Cl, and Br) during Film Deposition Liu et al., to be submitted to Phys. Rev. Lett. CCl (A2? ? X2Π) ??=0 CHF ?1A(000) – X1A(000) Excitation Spectra of CCl and CHF Liu et al., unpublished. Molecular Beam Scatter Beam + Scatter Beam Substrate Molecular Beam Laser Molecular Beam Laser Substrate Laser Molecular Beam LIF of CHF in CH2F2+CH4 Plasma Liu et al., to be submitted to J. Appl. Phys. LIF of CCl in CCl4+CH4 Plasma Molecular Beam Substrate Molecular Beam Laser Molecular Beam Laser Substrate Laser Molecular Beam Scatter Beam + Scatter Beam Liu et al., unpublished. Radical System Pressure (mTorr) Film Deposited S CH CH CH CH4/Ar CH4/Ar CH4/Ar 50/0 40/10 30/20 a-C:H a-C:H a-C:H 0.01 (0.05) 0.01 (0.04) 0.01 (0.05) SiH SiH SiH SiH SiH CH4/SiH4 CH4/SiH4 CH4/SiH4 N2/SiH4 NH3/SiH4 0/100 40/60 85/15 30/20 15/35 a-C:Si:H a-C:Si:H a-C:Si:H a-Si:N:H a-Si:N:H 0.02 (0.06) 0.06 (0.07) 0.02 (0.11) 0.03 (0.03) 0.02 (0.05) CN CN CN N2/CH4 N2/CH4 N2/CH