数字微镜器件制造精度误差对紫外光调制特性的影响.pdfVIP

第 33 卷第 4 期 应用光学 Vo l. 33 No.4 2012 年 7 月 10umal of Applied Optics 1ul.2012 文章编号: 1002-2082(2012)04-0788-05 数字微镜器件制造精度误差对紫外光调制特性的影响 袁晓峰，浦东林，中 溯，陈林森 (苏州大学信息光学工程研究所先进光学制造技术教育部重点实验室，江苏苏州 215006) 摘 要z 数字微镜器件(DMD)的能量利用率对于提高元掩膜激光直写系统的效率十分重要。对 DMD 在相千光照明下的相位调制特性进行数值和实验分析，发现同种型号 DMD 在出射0 级丸 垂直于微镜表面角度入射情况下的衍射图样，其光能量分布各不相同，有 0 级光强占总光强 27.2%的情况，也有零 0 级光强占总光强 13.1% 的情况，理论计算表明 .DMD 的微镜偏转角存 0 的误差可以使 在士1 DMD 衍射 0 级的衍射效率在极大和极小之间变化。这-结论对于选择高 能量利用效率的 DMD 有重要参考价值。 关键词z 光学器件z 数字微镜器件(DMD): 元掩膜光刻系统;相位调舍，) :闪耀光栅 中圈分类号:TN29;0438 文献标志码:A dol: 10. 5768!1A0201233. 0405002 Phase modulation properties of digital micromirror device in UV beam YUAN Xiao-feng. PU Dong-lin. SHEN Su , CHEN Lin-sen (Institute of Information Optical Engineering. Soochow University. Suzhou 215006. China) Abstract: In order to improve the optical energy utilization of the maskless lithography system based on dígital micromirror device (DMD). the phase modulation properties of DMD at UV laser illumination were investigated. The impact on the phase modulation properties caused by the processing error of DMD was analyzed. The diffraction patterns of three DMDs of the same model at the UV laser illumination were tested , and results showed that their light fíeld distri- butions were significantly different. the DMD processing error had great impact on the phase modulation properties. This conclusion has great reference significance for choosing DMDs with high utilization efficiency. K句帆lIds:optical devices: DMD ,maskless lithography system: phase modulation; blazed grating 效率对整个系统有重要意义，因为光的