添加剂浓度对直流电解沉积纳米孪晶cu微观结构的影响-金属学报.pdf

第52 卷 第8 期 Vol.52 No.8 2016 年 8 月 第973-979 页 ACTA METALLURGICA SINICA Aug. 2016 pp.973-979 添加剂浓度对直流电解沉积纳米孪晶 Cu 微观结构的影响* 金 帅 程 钊 潘庆松 卢 磊 ( 中国科学院金属研究所沈阳材料科学国家(联合)实验室, 沈阳 110016) 摘 要 采用直流电解沉积技术制备出具有高密度择优取向的纳米孪晶结构块体纯Cu 样品. 利用XRD, SEM 和TEM 等手 段研究了添加剂浓度对其微观结构的影响. 结果表明, 样品由沿沉积方向生长的微米尺寸柱状晶粒构成, 晶粒内含有高密 度孪晶界, 且大部分孪晶界平行于生长表面. 添加剂( 明胶)浓度对纳米孪晶Cu 的孪晶片层厚度有明显影响, 但对晶粒尺寸 影响不大. 无添加剂时, 纯Cu 样品中存在微米量级宽大孪晶片层, 当添加剂浓度从0.5 mg/L 增加到5 mg/L, 孪晶片层厚度 从150 nm 减小至30 nm, 且孪晶界生长更完整. 其原因是随着添加剂浓度增加, 阴极过电位增大, 孪晶界形核率增加, 从而 使孪晶片层厚度减小. 关键词 纳米孪晶Cu, 直流电解沉积, 孪晶片层尺寸, 添加剂 中图法分类号 TG 146 文献标识码 A 文章编号0412-1961(2016)08-0973-07 EFFECT OF ELECTROLYTE ADDITIVE CONCEN- TRATION ON MICROSTRUCTURE OF DIRECT- CURRENT ELECTRODEPOSITED NANOTWINNED Cu JIN Shuai, CHENG Zhao, PAN Qingsong, LU Lei Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China Correspondent: LU Lei, professor, Tel: (024) E-mail:llu@imr.ac.cn Supported by National Natural Science Foundation of China (Nos.51420105001, and and National Basic Research Program of China (No. 2012CB932202) Manuscript received in 2015-10-15, in revised form 2015-12-30 ABSTRACT Nanotwinned metals have attracted widespread attentions recently, due to their unique overall properties, such as high strength, considerable ductility, enhanced work hardening and high electrical conductivity. The method of synthesized nanotwinned metals is an essential factor for influencing its appl