电子束蒸发氧化钛薄膜制备的工艺研究.pdf

摘 要 摘 要 在光学薄膜制备中，TiO 是常用的高折射率材料。在采用电子束蒸发法制备 2 TiO 光学薄膜的工艺时，TiO 薄膜的光学特性强烈依赖于薄膜的制备工艺。 2 2 在ZZ630电子束蒸发镀膜系统上加氧(纯度99．99%)辅助镀膜后，采用TiO 作 2 为蒸发材料制备光学用的氧化钛薄膜。考察了镀膜过程中通入O 的量、蒸发速率 2 和烘烤温度对薄膜光学性能的影响。本论文开展了对电子束蒸发氧化钛薄膜制备 工艺的研究，并进行了系统性实验。用723PCS可见分光光度计测试了薄膜的透射 光谱，并通过干涉极值计算方法获得了薄膜的折射率等参数。实验表明，采用TiO2 作为蒸发源物质时，薄膜具有较好的光学性能，在可见光范围内薄膜的折射率变 化在2.1—2.6 。 关键字：薄膜光学，TiO 薄膜，光学常数，反射率 2 I ABSTRACT ABSTRACT TiO2 is often used as high refractive index material in optical thin film preparation．When preparing TiO2 thin film by E-beam evaporation，the properties of thin film depend on the process parameter. After adding IAD with O (purity 99.99%)as source ，we prepared the TiO thin films 2 2 by the ZZ.630vacuum electron-beam deposition system．The optical characteristics of thin films were investigated at various process parameters ，such as different parameters of oxygen flux，evaporating rate and substrate temperature. This paper investigated Titanium dioxide thin films by electron beam evaporation process, and carried out systematic experiments. We measured the transmittances spec tra through 723PCS Spectrophotometer, and deduced refractive indexes from the extremum of reflectance or transmittance ． The experiments results show that the thin films taken Ti02 as origin material，the thin film has good transmittance ，and the refractive index changed from 2 ．