第三章 微纳制造技术_3光刻工艺.pdf

2014-5-24 单项工艺： 光刻 1. Introduction Key Historical Events in Photolithography • 1826- Joseph Nicephore Niepce, in Chalon, France, takes the first Photolithography photograph using bitumen of Judea on a pewter plate, developed using oil of lavender and mineral spirits. • Photo-litho-graphy: latin: light-stone-writing • 1843- William Henry Fox Talbot, in England, develops • Photolithography is an optical means for transferring patterns dichromated gelatin, patented in Britain in 1852. onto a substrate. It is essentially the same process that is used in • 1935- Louis Minsk of Eastman Kodak developed the first lithographic printing. synthetic photopolymer, poly(vinyl cinnamate), the basis • Patterns are first transferred to an imagable photoresist layer. of the first negative photoresists. • Photoresist is a liquid film that can be spread out onto a substrate, exposed with a desired pattern, and developed into a • 1940- Otto Suess of Kalle Div. of Hoechst AG, developed selectively placed layer for subseque