晶圆扫描光刻系统的有效非因果学习控制-控制理论与应用.PDF

30 10 Vol. 30 No. 10 2013 10 Control Theory Applications Oct. 2013 DOI: 10.7641/CTA.2013.21090 , , (1. , 150001; 2. , 200233) : , . , . , . , , . , , , . , . : ; ; ; ; : TP273 : A Effective non-causal learning control for wafer scanner systems CHEN Xing-lin , JIANG Xiao-ming , WANG Cheng (1. School of Astronautics, Harbin Institute of Technology, Harbin Heilongjiang 150001, China; 2. Shanghai Electro-Mechanical Engineering Institute, Shanghai 200233, China) Abstract: This paper presents an effective non-causal learning control method which is applied to the wafer scan and lithography system. It is independent of the precise model of the system and introduces a time delay factor to shape the convergence condition of the iterative control system. A zero-phase filter is developed to make a second shaping for the convergence condition; thus, a convergent non-causal iterative learning control law is determined. According to the characteristics of the closed-loop system, we put forward the referential methods for selecting the delay factor as well as the filter, and verify the convergence of the built-up closed-loop system. In addition, an effective learning function is introduced to avoid the blind learning in the traditional method for improving the scanning performance and enhancing the learning abilities of the key performance. Finally a simulated wafer scan and lithography system is employed to implement simulations and experiments for validating the effectiveness of the proposed method. Key words: wafer scan