Mass Deposition, Etching and Sputtering Effects of Low-Energy N＋ Ion Irradiation on Solid Fly Ash.pdf

PlasmaScienceandTechnology，Vo1．15，No．12，Dec．2013 M assDeposition，Etchingand SputteringEffectsofLow-Energy Ion Irradiation on SolidFly Ash MIAOChunguang(苗春光)，WANGXiangqin(王相勤) KeyLaboratoryofIonBeam BioengineeringjHefeiInstitutesofPhysicalScience ChineseAcademyofSciences．Hefei230031．China AbstractFlyashisanindustria1wastecreatedwhencoalisburnedtogenerateelectrica1 power．Inthepresentstudy，weusedlow—energynitrogenionimplantationonflyashtoimproveits surfaceproperties．Scanningelectronmicroscope(SEM)，ofuriertransform infraredspectroscopy (FTIR)，X—rayphotoelectronspectroscopy(XPS)andinductivelycoupledplasma-atomicemission spectroscopy(ICP．AES)woreusedtostudythechangesofph)rsicalandchemicalpropertiesof flyashafterN+ionimplantation．andthemechanism offlyashmodifiedbyionimplantation．In theoptimalimplantationwithenergyof5keV and doseOf15Do，theionbeam couldeffectively increasethespecificsurfaceareafapproximately150％ increase)oftheflyash．Lotsofscratches weregenerated in thesurfaceofthefly ash aftorN ion implantation．thereforeitisgood ofr enhancing thespecificsurfacearea．Experimentalresultsshow thattheion implantation could openthechemicalbondsofSiO．Si—AlandA1一O．anddepositnitrogenionson thesnrfaceoffly ash． Keywords：flyash，nitrogenion，deposited，etching，sputtering PACS：52．77．Bn．52．77．Dq DOI：10．1088／1009—0630／15／12／13 1 Introduction erties，morphologyofmaterials，highhardness，adsorp— tion capacity，resistanceto corrosion and otherphysi— Fly ash isfinely divided mineralresiduefrom the calcharacteristics．Inthisarticle．withtheaidof1ow electricpowerplantandoneof