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电磁学论文翻译
Mechanism and control of sidewall growth and catalyst diffusion on oxide nanowire vapor-liquid-solid growth
Kazuki Nagashima, Takeshi Yanagida, Keisuke Oka, Hidekazu Tanaka, and Tomoji Kawai
Citation: Applied Physics Letters 93, 153103 (2008); doi: 10.1063/1.2978347
View online: /10.1063/1.2978347
View Table of Contents: /content/aip/journal/apl/93/15?ver=pdfcov
Published by the AIP Publishing
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APPLIED PHYSICS LETTERS 93, 153103 2008
Mechanism and control of sidewall growth and catalyst diffusion on oxide nanowire vapor-liquid-solid growth
Kazuki Nagashima, Takeshi Yanagida,a Keisuke Oka, Hidekazu Tanaka, and Tomoji Kawaib
Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
Received 30 May 2008; accepted 17 August 2008; published online 13 October 2008
Oxide nanowires formed via the vapor-liquid-solid VLS mechanism are attractive building blocks toward nanowire-based electronic devices due to their fascinating physical properties. Although well-deTned oxide nanowires are strongly required for the applications, tapering during oxide nanowire VLS growth has been detrimental and uncontrollable.
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