Atomic Force Microscope Nanolithography On Organized Molecular Films (2004)英文电子书.pdf

Atomic Force Microscope Nanolithography on Organized Molecular Films Seunghyun Lee Haiwon Lee Hanyang University, Seoul, South Korea INTRODUCTION Subsequently, several principal AFM nanolithography techniques on organized molecular films such as self-as- The ongoing miniaturization in size and integrity of sembled monolayers, Langmuir–Blodgett (LB) monolay- electronic and mechanic devices has led to an interest in er, and spin-coated polymer films will be illustrated. fabrication of nanometer-sized uniform structures on surfaces. With the device downscaling dimensions to the nanometer range, current interest is focused on the state- AFM-BASED NANOLITHOGRAPHY of-the-art lithographic development such as electron beam lithography, extreme UV lithography, imprint lithogra- Dip-Pen Nanolithography phy, and scanning probe microscope (SPM) lithography. Binnig et al.[1] first developed the scanning probe mi- Mirkin and coworkers[6,7] introduced a dip-pen nano- croscope in 1982, and since then, SPM have been pri- lithography (DPN) to construct patterns of molecules on a marily used to obtain topographic and electronic surface substrate in a positive printing by using an AFM tip as a maps. Nowadays, SPM is also being used to fabricate ‘‘pen,’’ Au substrate as a ‘‘paper,’’ and alkanethiols with patterns and structures in nanometer scale, as well as to chemical affinity for Au substrate as ‘‘molecular inks.’’ In directly modify chemical or physical structure of surfaces. DPN, molecules are moved from the AFM tip to the solid Among several nanolithographic methods, scanning substrate via