图形转移技术教学教材.ppt

Here comes your footer 31 Inspection Inspection of the templates using electron beams for applications requiring sub-50 nm lithography will be needed. Hence, the template will require a scheme to dissipate charge during the inspection process The ITO layer： do an excellent job controlling the charging. E-beam inspection images of an ITO template: 140 nm features with programmed defects have been successfully inspected (at 50 nm pixel inspection). Here comes your footer 32 repairation We have recently focused on exploring repairing clear and opaque defects on nano-imprint templates using focused ion beam(FIB) and e-beam technologies Repairs were performed on templates after chrome patterning and after relief etching of the quartz SEM images of the imprinted templates revealed high spots in the cured monomer where the repairs have been made. These high spots appear to be caused by excess milling, or lack of depth control. Here comes your footer 33 Nano-imprint tool Imprio 100 tool (Molecular Imprints Inc.): designed as a step-and-repeat patterning tool and can accommodate wafer sizes up to 200 mm in diameter class 0.1 mini-environment: In order to minimize defect issues during the imprint process, the tool is equipped with a class 0.1 mini-environment. a multiple jet dispense head: for the dispensing of the etch barrier which led to reducing the imprint time. Etch barrier thickness comparison between single and multi-jet dispense systems. Here comes your footer 34 Pattern transfer a multi-layer scheme: pattern the underlying ?lms Because of the presence of a residual layer of the etch barrier (EB) over the transfer layer, it is essential to minimize the thickness of the etch barrier for subsequent pattern transfer of sub-45 nm features into wafer-level ?lms such as oxides. Our focus has been on developing a very robust wafer-level pattern transfer process with an optimized imprinting process using a multi-jet dispense system which results in a very thin layer of the