应用于化合物半导体工业生产的解决方案.pdf

应用于化合物半导体工业生产的解决方案 应用于减薄的和易损的化合物半导体基片的临时键合和键合分离技术 应用于电解质，厚胶和薄胶以及高台阶的喷涂技术 应用于器件构图和高级封装的光刻技术 应用于键合介质层转移和高级封装的晶圆键合技术 如需了解更多产品信息以及下载产品手册，敬请登录 /compoundsemi （右上角） ISSN to be assigned semiconductorTODAY 面向亚洲中文读者的化合物及先进硅半导体新闻杂志 A S I A 2015 第4卷第4期 Lower Cost LEDs Faster LED Adoption Another breakthrough from Veeco. This time it’s EPIK. Introducing Veeco’s new TurboDisc® EPIK700™ GaN MOCVD system As global consumption for LED general lighting accelerates, manufacturers need bigger, better MOCVD technology solutions that increase productivity and lower manufacturing costs. The EPIK700 MOCVD system combines Veeco’s award-winning TurboDisc reactor design with improved wafer uniformity, increased productivity and reduced operations expenses to enable a cost per wafer savings of up to 20 percent compared to previous systems. It also features a reactor with more than twice the capacity of previous generation reactors. This increased volume coupled with productivity advancements within the EPIK700 reactor, results in an unmatched 2.5x throughput advantage over previous reactors. Learn how Veeco’s TurboDisc EPIK700 GaN MOCVD system can improve your LED manufacturing process today. The advantage is not just big. It’s EPIK. Contact us at /EPIK700 to learn more. Veeco’s New TurboDisc EPIK700 GaN MOCVD System contents