基于表界面调控的光催化反应研究-化学工程与技术专业论文.docx

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2018-05-05 发布于上海
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基于表界面调控的光催化反应研究-化学工程与技术专业论文.docx

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基于表界面调控的光催化反应研究-化学工程与技术专业论文

AbstractWiththehighlightofgrowingenergycrisisandenvironmentalpollution,theapplicationofsolarenergyhasbeenattractingmoreattention.Whereinthesurfaceandinterfacepropertiesofthephotocatalystsarecrucialtophotocatalyticresearch,whichwillprovidetheimportanttheoreticalbasisfordesignandpreparationofnovelphotocatalysts.Thispaperfocusesonthemodificationofmetal-oxidephotocatalystof TiO2andCu2O,andintensivelystudiestheirsurfaceandinterfaceproperties.Modificationsincludedoping,crystal-facettuning,surface-electronic-structuremodulationandquantumdot.Thenthisworksystematicallystudiedthemodulationof morphologyandpropertiesandtheireffectsonthephotocatalyticreaction.ThedopingofmetalionsareappliedtomodifythebandstructureandchemicalenvironmentoflatticeofTiO2toincreasethecharge-separationefficiency.DirectlyhydrolysismethodwasusedtopreparethemetaldopedTiO2.V4+andFe3+aredopedintothelatticeofTiO2inthestructureofTi-O-M,andthedopingtypeofCeionsisinterstitial,whileCrandCuionscannotentertheskeletonbuthighlydisperseonthesurface.Therefore,V-andFe-dopedcatalystsshowthehighestreactivityinthephotocatalyticisomerizationofnorbornadiene(NBD).Then,V-andFe-TiO2withdifferentdopingconcentrationareprepared.Withthehigherdopingconcentration,Fe3+canuniformlydisperseintothelattice,andwhenthedopingconcentrationishigher,thesmallerparticlecanbeachieved.Importantly,thesamplewithTi/Feof10 showshighestactivity.ForVdoping,higherconcentrationcausesthesurfaceenrichmentofV2O5,andthebestphotoactivityisachievedwhenTi/V=15.Furthermore,thephotocatalyticreactivityiscloselyrelatedtothelatticeoxygen:firstly,thephotoinducedholeofTiO2canbetrappedbythelatticeoxygenandsubsequentlytransferredtotheadsorbedNBDandformtheintermediate,finallyresultedintothequadricyclane.Then,asimplestrategywasdevelopedtofabricateTi3+-defectedV-TiO2quantumdots(QDs)onMCM-41bycombiningtraceV-dopingandMCM-41loadingstrategies.QDsarehighlydispersedonMCM-41withoutanyaggregations,andexhibitquantumsizeeffect.Ti3+defectsandV4+dopantsleadtonewbandlevelsneartheconduc