用于光子芯片的Ge-Sb-Se光学薄膜的制备与性能表征【毕业论文】.doc

- PAGE I - 本科毕业设计 （20 届） 用于光子芯片的Ge-Sb-Se光学薄膜的制备与性能表征 所在学院 专业班级 通信工程 学生姓名 学号 指导教师 职称 完成日期 年 月 PAGE I 摘　要 【摘要】硫系玻璃具有卓越的三阶非线性，已成为全光网络关键器件的理想基质材料。本文首先回顾了硫系玻璃薄膜的材料特性、研究历程及应用背景。介绍了几种常见的薄膜物理气相沉积技术，并根据现有条件采用磁控溅射沉积技术制备用于光子芯片的Ge-Sb-Se光学薄膜。通过Swanepoel光学常数计算方法获得薄膜的相关性能表征参数。另外通过X射线光电子能谱、光谱型椭偏仪、表面轮廓仪、分光光度计、显微拉曼光谱仪等现代测量方法测试了薄膜的厚度、折射率、透过光谱、表面粗糙度、内部微观结构等参数。结果表明磁控溅射制备的Ge-Sb-Se光学薄膜具有良好的光学特性，并与Ge-Sb-Se靶材块体玻璃保持较高的一致性，在集成光学器件领域具有较强的应用价值。 【关键词】硫系玻璃；硫系薄膜；磁控溅射；光学性能。  Abstract 【ABSTRACT】Chalcogenide glasses offer excellent property of third-order nonlinear, which makes it “hero” material for key devices of all-optical network. In this thesis, the material properties, research background and application of chalcogenide glass thin film have been reviewed. Also some normal film PVD technologies are introduced. Glass thin films of Ge-Sb-Se were deposited on SiO2 substrate by magnetron sputtering. Some key optical parameters such as refractive index(n), thickness(d) and optical band gap(Eg), were determined using the transmission spectra based on Swanepoel’s method. And those parameters were demonstrated by XPS, Spectral ellipsometer, Surface profiler, Spectrophotometer and Raman spectroscopy respectively. The result shows that optical thin-film prepared by magnetron sputtering deposition have excellent optical property and high consistency with Ge-Sb-Se target glass. It has great development foreground in integrated optical devices application. 【KEYWORDS】Sulfur glass;Sulfur film;Maguetron Sputtering;Optical properties. 目　录 TOC \o 1-3 \h \u HYPERLINK \l _Toc293695022 摘　要 PAGEREF _Toc293695022 \h II HYPERLINK \l _Toc293695023 Abstract PAGEREF _Toc293695023 \h III HYPERLINK \l _Toc293695024 目　录 PAGEREF _Toc293695024 \h IV HYPERLINK \l _Toc293695025 1 绪论 PAGEREF _Toc293695025 \h 1 HYPERLINK \l _Toc293695026 1.1 硫系玻璃简介 PAGEREF _Toc293695026 \h 1 HYPERLINK \l _Toc29