2006能源与光电薄膜科技研讨会论文摘要格式说明-YOKEnet.doc

靶電流對Cr-C-N薄膜機械性質影響之研究 楊玉森1? 葉瀚文1? 林嘉豪2? 1國立高雄第一科技大學機械與自動化工程系 2國立高雄第一科技大學工程科技研究所 摘要 本研究利用反應性非平衡磁控濺鍍於SKH51高速鋼表面上濺鍍Cr-C-N薄膜，主要是要探討靶電流對Cr-C-N薄膜機械性質之影響。實驗固定參數為乙炔流量40%、氬氣25sccm、基板偏壓75V、基板頻率75KHz、工作距離9cm、基材轉速9rpm、離子轟擊電壓400V。改變靶電流參數由5A逐漸降至1A。Cr-C-N薄膜之晶體結構及顯微組織是由XRD、TEM及拉曼分析。薄膜之摩擦係數及磨耗率是由ball-on-disk磨耗實驗量測。實驗結果顯示，薄膜之摩擦係數與磨耗率會隨靶材電流之增加而增加。在靶電流3A以上時，薄膜結構為Cr23C6+Cr7C3，摩擦係數介於0.5~0.6之間，随著靶電流降低至2A以下時，薄膜轉變為非晶質DLC結構嵌入碳化物CrC，摩擦係數由0.5降至0.26。磨耗率則由1.67 E-05 mm3?N-1?m-1 降至4.17E-06 mm3?N-1 關鍵字:DLC、CrC、非晶質 英文摘要 In this study, the Cr-C-N films are deposited on high speed tool steel(SKH51) by the reactive unbalanced magnetron sputtering process .This paper is aimed to investigate the effects of target current on the mechanical properties of Cr-C-N coatings. The crystal and microstructures of Cr-C-N films were examined by XRD,TEM and Ramen and the wear properties were tested by ball-on-disk. The experimental results show that the friction coefficient and wear rate of Cr-C-N films were increased with increasing target current. At target current bigger than 3A, the crystal structure was identified as Cr23C6+Cr7C3 phase and the friction coefficient and wear rate of films were tested between 0.5~0.6 and 1.67 E-05 mm3?N-1?m-1 respectively. At target current 2A, the crystal structure was identified to be CrC imbedded in DLC and the friction coefficient of films decrease to 0.26 and the wear rate is reduced from 1.67 E-05 mm3?N-1?m-1 to 4.17E-06 mm3?N-1?m Key word:DLC、CrC、amorphous 前言 近來二十年來發展的陶瓷薄膜中，鉻系薄膜已廣泛應用於各產業中，其中CrN薄膜是一個具有高硬度、高附著力、抗沾黏、高溫抗氧化性和耐蝕性，其中又因抗沾黏的特性，使模具有良好的脫模力，故常被應用在射出成型模具上[1]；CrC薄膜硬度為Hv1500~1800，雖然硬度低於CrN薄膜，但碳化鉻可提升材料的強度、韌性及減少磨耗行為。Cr-C-N薄膜會隨著碳氮比例不同，具有CrC與CrN薄膜混合的特性，文獻指出當CrN膜中加入C元素後，形成之CrCN薄膜具更高硬度，微硬度HV2200~4430[2,3]、更好的耐磨性[4]及耐腐蝕性 REF _Ref296206339 \r \h 5，降低摩擦係數於0.4至0.5之間[3]，同時具有不錯的抗沾黏性質，但抗氧化性能及附著力因加入碳元素後有所下降[3]。當以CrC為基底添加N元素之CrCN薄膜，其硬度略為提升，約在Hv1600~2000 REF _Ref296206374 \r \h 6，具有低摩擦係數約為0.2 REF _Ref296206386 \r \h 7及耐磨料磨耗的特性。由於CrCN具有高硬度、低摩擦係數、耐摩耗性及抗沾黏性，在切削刀具及模具應用上，具有極