AlSiO2周期迭层膜式微型偏光器中的Al膜层.PDF

1998 7 　　　　　 31　 4 Jul. 1998 　　　　　　 JOURNAL OF TIANJIN UNIVERSITY　　　　　　　　Vol. 31　No. 4　 / Al SiO2 Al 胡　明 　董向红　刘志刚　鲍振武 () 　　对周期性 Al /SiO 迭层膜式微型偏光器中的 Al膜层进行了研究. 高消光比的迭层膜式 2 微型偏光器的性能主要决定于 膜层的介电 数.从理论上分析了影响 膜层介电 数的因素 Al Al 及 Al膜层的介电 数偏离体金属 Al相应值的原因. Al膜层溅射沉积条件实验研究结果表明,沉 积速率、膜层厚度及基底形貌的控制和选择是非 重要的. 　,,, 　 TN701 AN INVESTIGATION ON Al THIN FILMS IN THE PERIODIC / Al SiO2 LAMINATED LAYERSMICROPOLARIZER Hu Ming　Dong Xianghong　Liu Zhigang　Bao Zhen u ( School of Elect ronic Information Engineering , Tianjin Uni ersity) Abstract　 In this paper the Al thin film in the periodic Al / SiO laminated layers micropolarizer is 2 . / in estigated The characteristics of the periodic Al SiO2 laminated layer micropolarizer with a high . extinction ratio depend mainly on the specific dielectric constant of the Al thin film The effects of the factors on the specific dielectric constant of Al thin film and causes for the difference in the al- ues of th e specific dielectric constant betw een the Al film and the bulk Al are analysed. The deposi- . tion conditions for Al thin films ha e been studied in the experiments The results show that the optimal control and choice of th e deposition rate, the thickness of th e film a