固态电子学课件presentation-RIE.pptxVIP

Group members: 董斌，李维昊，夏鹏昆，王丰;[1]Stephen A. Campbell Fabrication Engineering at the Microand Nanoscale;background;What is the mechanism?;What is the advantages?;High selectivity is preferred! ;High etching rate;Sustc students’ presentation;Sustc students’ presentation;Sustc students’ presentation;Ideal vs problems;Sustc students’ presentation;Deep reactive ion etching as a tool for nanostructure fabrication(制造);Nanopillars Silicon nanowires Carbon nanotubes on Si nanopillars Nanowalls Nanonetworks ; potential of DRIE: 1、ultrasmall（超小型） 2、large-area（大面积） 3、3D nanofabrication（3D纳米制造） ;17.6% Conversion Efficiency Multicrystalline Silicon Solar CellsUsing the Reactive Ion Etching with the Damage Removal Etching;Advantages: 1、Deep and narrow textured（刻） surface showed excellent low reflectance 2、RIE texturing with a proper DRE had sufficiently higher short circuit current (Isc) than acidic-textured samples without a drop in open circuit voltage (Voc). （ acidic-textured RIE-textured Isc: 200mA ）; 1、The crystalline structure of the RIE-processed diamond is preserved, while the FIB(focused ion beam)-processed diamond membrane has a broad-background sp2 feature. 2、RIE-based process produces no detectable damage, while the FIB-processed sample has an amorphous carbon layer of about 11 nm thick.