集成电路工艺和版图设计参考.pptx

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微电子制造工艺;IC常用术语;IC工艺常用术语;生产工厂简介;FabTwowascompletedJanuary2,1996andisaStateoftheArtfacility.This2,200squarefootfacilitywasconstructedusingallthelatestmaterialsandtechnologies.Inthissetofcleanroomswechangetheair390timesperhour,ifyoudothemathwithULPAfiltrationthisisaClassOnefacility.WehavehadittestedanditdoesmeetClassOneparameters(withoutanypeopleworkinginit).Sincewearenotmakingmicroprocessorshereandwedontwanttowearspacesuits,werunitasaclass10fab.EventhoughitconsistentlyrunswellbelowClassTen.;HereintheFabTwoPhotolithographyareaweseeoneofour200mm.35micronI-LineSteppers.thissteppercanimageandalignboth68inchwafers.;AnotherviewofoneoftheFabTwoPhotolithographyareas.;Hereweseeatechnicianloading300mmwafersintotheSemiTool.Thewafersareina13waferTefloncassetteco-designedbyProcessSpecialtiesandSemiToolin1995.Againthesearetheworldsfirst300mmwetprocesscassettes(thatcanbespinrinsedried).;AswelookinthiswindowweseetheWorldsFirsttrue300mmproductionfurnace.Ourdevelopmentanddesignofthistoolbeganin1992,itwasinstalledinDecemberof1995andbecamefullyoperationalinJanuaryof1996.;;ProcessSpecialtieshasdevelopedtheworldsfirstproduction300mmNitridesystem!Webeganprocessing300mmLPCVDSiliconNitrideinMayof1997.;;CurrentlyourPS300AandPS300Bdiffusiontoolsarecapableofrunningboth200mm300mmwafers.Wecanevenprocessthetwosizesinthesamefurnaceloadwithoutsufferinganyuniformityproblems!(ThermalOxideOnly);AccuracyinmetrologyisneveranissueatProcessSpecialties.Weusethemostadvancedroboticlaserellipsometersandothercalibratedtoolsforprecisionthinfilm,resistivity,CDandstepheightmeasurement.IncludingournewNanometrics8300fullwafer300mmthinfilmmeasurementandmappingtool.Wealsouseoutsidelaborato

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