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-HonorsThesisDefense-
InSituEllipsometryofSurfacesinanUltrahighVacuumThinFilmDepositionChamberJosephChoiDepartmentofPhysicsandAstronomy,BrighamYoungUniversityJune19,200112/1/20241
DefinitionofTermsUHV(ultrahighvacuum)-Basepressure10-9torr. (Atmosphericpressureis7.6x102torr)Ellipsometry-Opticalmeasurementtechniqueofreflection,transmission,opticalconstants,andthicknessusingpolarizationoflight.Insitu-Measurementinsidethechamberwithoutopeningtotheatmosphere.Evaporation-Depositionofmaterialbythermallyheatingitusingmetallicboatswithhighresistance.Sputtering-Depositionbybombardingpositiveionsontothematerial,andphysicallyvaporizingit.12/1/20242
ResearchGoalsBuilding: BuildaUHV(ultrahighvacuum)chamberwithinsituellipsometry,sputtering,andevaporationcapabilities.Measurement/Modeling: Measureanddevelopmodelforthinfilmoxidation.12/1/20243
Motivation–StudyofOxidationReflectanceofasiliconfilmcanvaryfrom70%tobelow5%dependentonoxidation.Immediateoxidizationwhenexposedtoatmosphere.(ModelofasiliconfilmproducedusingIMD?)12/1/20244
ThesisDescriptionDesignandbuildingofvacuumchamberfromstainlesssteelbodymadebyVarian,Inc.–SinceApril2000.UHV,ellipsometry,deposition,procedures.Rutheniumthinfilm(?290?)sputteredinHV(highvacuum;10-8-10-6torr).Real-timeinsituellipsometricmeasurementstoanalyzeRuthinfilmanditsoxidation.12/1/20245
UHVVacuum(?10-9torr)Benefit-Purityoffilm: -ComparisonwithHV(10-6torr):Gasflux?1cm2/sec.AchievingUHV: -Cleanliness:Nooil;cleaningagents(hexane,methanol). -Bakeout:250oCtoeliminatewater,hydrogen,speeddegassing. -Parts:Minimizeo-rings,usemetal-to-metalseals. -Material:Lowoutgasrates(Aluminum,stainlesssteel). -Machining:Inertgasweldingorvacuumbrazing.12/1/20246
Conflatflange-CoppersealThermocoupleHeatingtape-BakeoutCleaningagent-Met
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